Publications

Papers:

  • Formation of thin Ni2Si and NiSi films using low temperature rapid thermal processing, J. P. Li; A. Hunter; R. Ramanujam; M. Liu; N. Tam; L. Tertitski; E. Tran2009 17th International Conference on Advanced Thermal Processing of Semiconductors
  • Si spontaneous emission during RTP and its impact on low-temperature pyrometry, J. P. Li; A. Hunter; R. Ramanujam2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors

  • Use of Virtual Metrology for in-situ Visualization of Thermal Uniformity and Handoff Adjustment in RTP Critical Anneals, V. Vitale; W. Aderhold; A. Hunter; I. Iliopoulos; N. Kroupnova; A. Yanovich; N. Merry

    2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference

  • Applied Materials’ Product Portfolio and Roadmap, A. Hunter ; J. Zelenko ; R. Mani, 2007 15th International Conference on Advanced Thermal Processing of

  • SemiconductorsVirtual Metrology in RTP with WISR,W. Aderhold, I. Iliopoulos, A. Hunter2007 15th International Conference on Advanced Thermal Processing of Semiconductors
  • Pyrometry for laser annealingB. Adams; A. Mayur; A. Hunter; R. Ramanujam2005 13th International Conference on Advanced Thermal Processing of Semiconductors
  • Ultra low temperature NISI processing, A. Hunter; C. Tanasa; R. Ramanujam; A. Tang; N. Tam; B. Ramachandran; R. Achutharaman; S. Ramamurthy; J. Ranish2005 13th International Conference on Advanced Thermal Processing of Semiconductors
  • Dynamic surface anneal: activation without diffusion, D. Jennings; A. Mayur; V. Parihar; H. Liang; R. Mcintosh; B. Adams; T. Thomas; J. Ranish; A. Hunter; T. Trowbridge; R. Achutharaman; R. Thakur

    12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.

  • RTP uniformity improvement through simulation, C. Tanasa; J. Ranish; A. Hunter; S. Ramamurthy; R. Jallepally; B. Ramachandran; C. Lai; A. Tjandra; N. Tam12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.

  • Traceable emissivity measurements in RTP using room temperature reflectometryA. Hunter; B. Adams; R. Ramanujam11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003Reduction of pattern effects in RTP Centura systemW. Aderhold; S. Poarch; A. Hunter. 10th IEEE International Conference of Advanced Thermal Processing of Semiconductors

  • A novel in-situ lightpipe pyrometer calibration technique,A. Hunter; B. Adams; A. Rubinchik; G. Pham. 9th International Conference on Advanced Thermal Processing of Semiconductors, RTP 2001

 

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